Time of Flight Mass Spectrometry ( TOF SIMS)

 

• High mass resolution with  mass range  0 -12000 a.m.u.

• Depth profiling using sub keV O or Cs beams (nm depth resolution) 

• 2-D and 3-D chemical ion imaging (100 nm lateral resolution )

• Parallel detection - Significant benefit for detecting unknown contaminants at interfaces and analysis of unknown  complex structures

• Retrospective  reconstruction of data from any region of interest (ROI)  post acquisition - off line.

Key Applications

 

• Semiconductors - depth profiling and interface contamination

• ​Failure analysis - identification of organics and inorganics

• Coatings and thin films 

• Medical devices 

• Reverse Engineering